Furthermore the diffusion coefficient for the diffusion of H in Ni depends on temperature as
(b) For thin-walled cylindrical tubes that are pressurized the circumferential stress is a function of the pressure difference across the wall (?p) cylinder radius (r) and tube thickness (?x) as
Compute the circumferential stress to which the walls of this pressurized cylinder are exposed.
(c) The room-temperature yield strength of Ni is 100MPa (15000psi) and furthermore sy diminishes about 5MPa for every 50oC rise in temperature. Would you expect the wall thickness computed in part (b) to be suitable for this Ni cylinder at 300oC? Why or why not?
(d) If this thickness is found to be suitable compute the minimum thickness that could be used without any deformation of the tube walls. How much would the diffusion flux increase with this reduction in thickness? On the other hand if the thickness determined in part (c) is found to be unsuitable then specify a minimum thickness that you would use. In this case how much of a diminishment in diffusion flux would result?

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